Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• lithography; exposure dose; high-resolution lithography; nanomagnets; nanostructure; overexposure; PMMA; polymer; resist carbonization; Introduction The continuous growth of the nanotechnology and microelectronic industries requires the development of new approaches and methods for the formation of nanoscale